Thorough characterization of a EUV mask
- Hiroyuki Mizuno
- Gregory McIntyre
- et al.
- 2009
- Photomask and Next-Generation Lithography Mask Technology 2009
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2 results for Kenneth Goldberg
Investigation of the current resolution limits of advanced extreme ultraviolet (EUV) resists
- Patrick P. Naulleau
- Clemens Rammeloo
- et al.
- 2006
- SPIE Advanced Lithography 2006