Publications

3 results for James A. Bruce

Predicting yield using model based OPC verification - Calibrated with electrical test data
- - James A. Bruce
  - Tso-Hui Ting
- 2008
- SPIE Advanced Lithography 2008
Setting MRC rules: Balancing inspection capabilities, defect sensitivity and OPC
- - Ian Stobert
  - James Bruce
  - et al.
- 2007
- SPIE Advanced Lithography 2007
Aids for driving lithography hard: Wafer level process control features
- - Emily Fisch
  - Reginald Bowley
  - et al.
- 2001
- Microlithography 2001