Predicting yield using model based OPC verification - Calibrated with electrical test data
- James A. Bruce
- Tso-Hui Ting
- 2008
- SPIE Advanced Lithography 2008
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3 results for James A. Bruce
Setting MRC rules: Balancing inspection capabilities, defect sensitivity and OPC
- Ian Stobert
- James Bruce
- et al.
- 2007
- SPIE Advanced Lithography 2007
Aids for driving lithography hard: Wafer level process control features
- Emily Fisch
- Reginald Bowley
- et al.
- 2001
- Microlithography 2001