Global optimization of masks, including film stack design to restore TM contrast in high NA TCC's
- Alan E. Rosenbluth
- David Melville
- et al.
- 2007
- SPIE Advanced Lithography 2007
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.