Kinetics of Ni3Si2 formation in the Ni 2Si-NiSi thin film reaction from in situ measurements
- J.A. Kittl
- M.A. Pawlak
- et al.
- 2007
- Applied Physics Letters
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4 results for J.A. Kittl
Stress evolution during Ni-Si compound formation for fully silicided (FUSI) gates
- C. Torregiani
- C. Van Bockstael
- et al.
- 2007
- Microelectronic Engineering
Transient and end silicide phase formation in thin film Ni/polycrystalline-Si reactions for fully silicided gate applications
- J.A. Kittl
- M.A. Pawlak
- et al.
- 2007
- Applied Physics Letters
Time-resolved temperature measurements during pulsed laser irradiation using thin film metal thermometers
- D.P. Brunco
- J.A. Kittl
- et al.
- 1993
- Review of Scientific Instruments