Compressive Diffusion Break Stressor for Gate-All-Around Nanosheet pFET Transistor Performance Improvement
- S. Hung
- S. Mochizuki
- et al.
- 2025
- VLSI Technology and Circuits 2025
Publications
2 results for Steven Hung
Novel Materials and Processes in Replacement Metal Gate for Advanced CMOS Technology
- Ruqiang Bao
- Steven Hung
- et al.
- 2018
- IEDM 2018