Post ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatments
- G.G. Totir
- M.M. Frank
- et al.
- 2007
- ECS Meeting 2007
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.