Post ion-implant photoresist removal via wet chemical cleans combined with physical force pretreatments
- G.G. Totir
- M.M. Frank
- et al.
- 2007
- ECS Meeting 2007
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2 results for T. Conard
Phase of reflection high-energy electron diffraction oscillations during (Ba,Sr)O epitaxy on Si(100): A marker of Sr barrier integrity
- G.J. Norga
- C. Marchiori
- et al.
- 2005
- Applied Physics Letters