Evaluation of 32nm Advanced immersion lithography pellicles
- N. Zhou
- K. Racette
- et al.
- 2008
- SPIE Photomask Technology + EUV Lithography 2008
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Novel Si-based composite thin films for 193/157 nm attenuated phase shift mask(APSM) applications
- S. Jay Chey
- C.R. Guarnieri
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering