Characterization of EUV image fading induced by overlay corrections using pattern shift response metrology
- Daniel Schmidt
- Roger Cornell
- et al.
- 2019
- EUVL 2019
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5 results for Roger Cornell
CDSEM AFM hybrid metrology for the characterization of gate-all-around silicon nano wires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2014
- SPIE Advanced Lithography 2014
Buckling characterization of gate all around silicon nanowires
- Shimon Levi
- Ishai Schwarzband
- et al.
- 2013
- SPIE Advanced Lithography 2013
OPC model data collection for 45nm technology node using automatic CD-SEM offline recipe creation
- Daniel Fischer
- Mohamed Talbi
- et al.
- 2007
- SPIE Advanced Lithography 2007
Characterization of Across-device Linewidth Variation (ADLV) for 65 nm logic SRAM using CDSEM and linewidth roughness algorithms
- W. Chu
- C. Radens
- et al.
- 2006
- SPIE Advanced Lithography 2006