Characterization of the polymer-developer interface in 193 nm photoresist polymers and formulations during dissolution
- Thomas Wallow
- Wendy Chan
- et al.
- 2002
- Microlithography 2002
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4 results for S.-W. Lee
Characterization of reactive dissolution and swelling of polymer films using a quartz crystal microbalance and visible and infrared reflectance spectroscopy
- W.D. Hinsberg
- F.A. Houle
- et al.
- 2005
- Macromolecules
Determination of the viscoelastic properties of polymer films using a compensated phase-locked oscillator circuit
- S.-W. Lee
- W.D. Hinsberg
- et al.
- 2001
- Analytical Chemistry
Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base
- William Hinsberg
- Seok-Won Lee
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering