Fluoropolymer resists: Progress and properties
- Hiroshi Ito
- H.D. Truong
- et al.
- 2003
- J. Photopolym. Sci. Tech.
Publications
Date
Featured collections
Popular topics
5 results for Masaki Okazaki
Fluoropolymers for 157/193 nm lithography: Chemistry, new platform, formulation strategy, and lithographic evaluation
- Hiroshi Ito
- H.D. Truong
- et al.
- 2002
- J. Photopolym. Sci. Tech.
Radical Copolymerization of 2-Trifluoromethylacrylic Monomers. III. Kinetics and Monomer Reactivities in the Copolymerization of t-Butyl 2-Trifluoromethylacrylate and Methacrylate with Styrene Bearing Hexafluoroisopropanol
- Hiroshi Ito
- Masaki Okazaki
- et al.
- 2004
- J Polym Sci Part A
Radical Copolymerization of 2-Trifluoromethylacrylic Monomers. II. Kinetics, Monomer Reactivities, and Penultimate Effect in Their Copolymerization with Norbornenes and Vinyl Ethers
- Hiroshi Ito
- Masaki Okazaki
- et al.
- 2004
- J Polym Sci Part A
Aliphatic platforms for the design of 157 nm chemically amplified resists
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering