Origin of the threshold voltage instability in SiO2/HfO2 dual layer gate dielectrics
- A. Kerber
- E. Cartier
- et al.
- 2003
- IEEE Electron Device Letters
Publications
Date
Featured collections
Popular topics
5 results for T. Kauerauf
Low Weibull slope of breakdown distributions in high-k layers
- Thomas Kauerauf
- Robin Degraeve
- et al.
- 2002
- IEEE Electron Device Letters
Characterization of the VT-instability in SiO2 / HfO2 gate dielectrics
- A. Kerber
- E. Cartier
- et al.
- 2003
- IRPS 2003
Characterization of the VT-instability in SIO2/HFO2 gate dielectrics
- A. Kerber
- E. Cartier
- et al.
- 2003
- IRPS 2003
Charge trapping and dielectric reliability of SiO2-Al2O3 gate stacks with TiN electrodes
- Andreas Kerber
- Eduard Cartier
- et al.
- 2003
- IEEE Transactions on Electron Devices