Charge trapping and dielectric reliability of SiO2-Al2O3 gate stacks with TiN electrodes
- Andreas Kerber
- Eduard Cartier
- et al.
- 2003
- IEEE Transactions on Electron Devices
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.