Silsesquioxane-based 193 nm bilayer resists: Characterization and lithographic evaluation
- Hiroshi Ito
- Hoa D. Truong
- et al.
- 2005
- Microlithography 2005
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.