Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Rama N. Singh
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
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10 results for Antoinette F. Molless
Characterization of line width variation
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2000
- SPIE Advanced Lithography 2000
Lithographic effects of mask critical dimension error
- Alfred K. K. Wong
- Richard A. Ferguson
- et al.
- 1998
- SPIE Advanced Lithography 1998
A comprehensive evaluation of major phase shift mask technologies for isolated gate sinictuies in logic designs
- Lars W. Liebmann
- Thomas H. Newman
- et al.
- 1994
- Microlithography 1994
Impact of attenuated mask topography on lithographic performance
- Richard A. Ferguson
- William J. Adair
- et al.
- 1994
- Microlithography 1994
Application of the Aerial Image Measurement System (AIMSTM) to the Analysis of Binary Mask Imaging and Resolution Enhancement Techniques
- R. Martino
- R. Ferguson
- et al.
- 1994
- Microlithography 1994
Linewidth variation characterization by spatial decomposition
- Alfred K. Wong
- Antoinette F. Molless
- et al.
- 2002
- Journal of Microlithography, Microfabrication and Microsystems
Optimum mask and source patterns to print a given shape
- Alan E. Rosenbluth
- Scott Bukofsky
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Alternating phase-shifting mask with reduced aberration sensitivity: Lithography considerations
- Alfred K. Wong
- Lars W. Liebmann
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Level-specific lithography optimization for 1-Gb DRAM
- Alfred K. Wong
- Richard Ferguson
- et al.
- 2000
- IEEE Trans Semicond Manuf