Design, preparation, characterization, and lithographic imaging of high performance chemically amplified deep UV resist
- Hiroshi Ito
- G. Breyta
- et al.
- 1997
- ACS Spring 1997
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3 results for B. Brunsvold
Novel classes of cyclic olefin polymers for 193 nm lithography
- P. Rao Varanasi
- R.D. Allen
- et al.
- 2001
- J. Photopolym. Sci. Tech.
Evolution of a 193 nm bilayer resist for manufacturing
- R.W. Kwong
- M. Khojasteh
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering