Quantitative metrology study of Cu/SiO2 interconnect structures using fluorescence x-ray microscopy
- Guangyong Xu
- X. Su
- et al.
- 2001
- Applied Physics Letters
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Quantitative nanoscale metrology study of Cu/SiO2 interconnect technology using transmission x-ray microscopy
- X. Su
- C.B. Stagarescu
- et al.
- 2000
- Applied Physics Letters