A high reliability Metal Insulator Metal capacitor for 0.18 μm Copper technology
- M. Armacost
- A. Augustin
- et al.
- 2000
- IEDM 2000
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3 results for Michael Armacost
When is bilayer thin-film imaging suitable: Comparison with single layer resists
- Scott Halle
- Alan Thomas
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Plasma-etching processes for ULSI semiconductor circuits
- M. Armacost
- P.D. Hoh
- et al.
- 1999
- IBM J. Res. Dev