Corrosion-free dry etch patterning of magnetic random access memory stacks: Effects of ultraviolet illuminationH. ChoK.-P. Leeet al.2000Journal of Applied Physics
Plasma etching of NiFe/Cu and NiMnSb/Al2O3 multilayers for sub-micron pattern definitionK.B. JungJ. Honget al.1999Journal of Magnetism and Magnetic Materials