Performance data on new tunable attenuating PSM for 193nm and 157nm lithography
- Hans Becker
- Frank Schmidt
- et al.
- 2004
- Photomask and Next-Generation Lithography Mask Technology 2004
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Development of a new PSM film system for 157 nm extensible to high transmission 193 nm lithography
- Hans Becker
- Jay Chey
- et al.
- 2003
- SPIE Photomask Technology 2003