Effect of inert gas additive on Cl2-based inductively coupled plasma etching of NiFe and NiFeCo
- K.B. Jung
- H. Cho
- et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Publications
5 results for T. Feng
Cl2-based inductively coupled plasma etching of CoFeB, CoSm, CoZr and FeMn
- K.B. Jung
- H. Cho
- et al.
- 1999
- Materials Science and Engineering B: Solid-State Materials for Advanced Technology
Inductively coupled plasma etching of CoFeB, CoZr, CoSm and FeMn thin films in interhalogen mixtures
- H. Cho
- K.B. Jung
- et al.
- 1999
- Materials Science and Engineering B: Solid-State Materials for Advanced Technology
Comparison of Cl2/He, Cl2/Ar, and Cl2/Xe plasma chemistries for dry etching of NiFe and NiFeCo
- K.B. Jung
- H. Cho
- et al.
- 1999
- JES
Interhalogen plasma chemistries for dry etch patterning of Ni, Fe, NiFe and NiFeCo thin films
- H. Cho
- K.B. Jung
- et al.
- 1999
- Applied Surface Science