Publications

2 results for Daniel V. Casmier

Approaches to etch resistant 193-nm photoresists: Performance and prospects
- - R.D. Allen
  - Juliann Opitz
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Cyclic olefm resist polymers and polymerizations for improved etch resistance
- - R.D. Allen
  - Juliann Opitz
  - et al.
- 1999
- J. Photopolym. Sci. Tech.