Projection reduction exposure with variable axis immersion lenses: Next generation lithography
- H.C. Pfeiffer
- R.S. Dhaliwal
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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2 results for S.K. Doran
High emittance source for the PREVAIL projection lithography system
- S.D. Golladay
- R.A. Kendall
- et al.
- 1999
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures