Relative merits of [formula omitted] and [formula omitted] plasma chemistries for dry etching of magnetic random access memory device elements
- K.B. Jung
- H. Cho
- et al.
- 1999
- Journal of Applied Physics
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3 results for A.T. Hurst Jr.
Plasma etching of NiFe/Cu and NiMnSb/Al2O3 multilayers for sub-micron pattern definition
- K.B. Jung
- J. Hong
- et al.
- 1999
- Journal of Magnetism and Magnetic Materials
High density plasma etching of NiFe, NiFeCo and NiMnSb-based multilayers for magnetic storage elements
- K.B. Jung
- J. Hong
- et al.
- 1999
- Applied Surface Science