Polymer chemistry considerations in the design of robust 193 nm photoresists
- R.D. Allen
- Hiroshi Ito
- et al.
- 1999
- ACS Spring 1999
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7 results for Richard Vicari
Dissolution/swelling behavior of cycloolefin polymers in aqueous base
- Hiroshi Ito
- R.D. Allen
- et al.
- 2000
- Microlithography 2000
Reactive ion etching of 193-nm resist candidates: Current platforms and future requirements
- Thomas I. Wallow
- Phillip J. Brock
- et al.
- 1998
- Microlithography 1998
Synthesis, characterization, and lithographic behavior of methylated poly(4-hydroxystyrene)
- D.R. McKean
- T.P. Sauer
- et al.
- 1990
- ACS Division of Polymer Chemistry Washington DC Meeting 1990
Modified polyhydroxystyrenes as matrix resins for dissolution inhibition type photoresists
- G. Pawlowski
- T.P. Sauer
- et al.
- 1990
- Microlithography 1990
Platform-dependent properties of 193nm single layer resists
- Robert D. Allen
- Thomas I. Wallow
- et al.
- 1998
- J. Photopolym. Sci. Tech.
Approaches to etch resistant 193-nm photoresists: Performance and prospects
- R.D. Allen
- Juliann Opitz
- et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999