Reactive monolayers in directed additive manufacturing – area selective atomic layer deposition
- Rudy J. Wojtecki
- Anuja DeSilva
- et al.
- 2018
- J. Photopolym. Sci. Tech.
Publications
30 results for Alexander Friz
Directed self-assembly of topcoat-free, integration-friendly high-χ block copolymers
- Eri Hirahara
- Margareta Paunescu
- et al.
- 2015
- SPIE Advanced Lithography 2015
Enhancing resolution with pupil filtering for projection printing systems with fixed or restricted illumination angular distribution
- Greg McIntyre
- Leon Teeuwen
- et al.
- 2013
- SPIE Advanced Lithography 2013
Endurance and scaling trends of novel access-devices for multi-layer crosspoint-memory based on mixed-ionic-electronic-conduction (MIEC) materials
- R.S. Shenoy
- K. Gopalakrishnan
- et al.
- 2011
- VLSI Technology 2011
Visualization of the develop process
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2011
- SPIE Advanced Lithography 2011
Two complementary methods to characterize long range proximity effects due to develop loading
- Linda K. Sundberg
- Greg M. Wallraff
- et al.
- 2010
- SPIE Photomask Technology + EUV Lithography 2010
Highly scalable novel access device based on Mixed Ionic Electronic Conduction (MIEC) materials for high density phase change memory (PCM) arrays
- K. Gopalakrishnan
- R.S. Shenoy
- et al.
- 2010
- VLSI Technology 2010
Simple and versatile methods to integrate directed self-assembly with optical lithography using a polarity-switched photoresist
- Joy Y. Cheng
- Daniel P. Sanders
- et al.
- 2010
- ACS Nano
A silicon-containing resist for immersion lithography
- Ratnam Sooriyakumaran
- Wu-Song Huang
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010
A method to characterize pattern density effects: Chemical flare and develop loading
- Linda K. Sundberg
- Gregory M. Wallraff
- et al.
- 2010
- Proceedings of SPIE - The International Society for Optical Engineering 2010