Publications

2 results for Chung Ju Yang

First Demonstration of 16nm Pitch Subtractive Ru Interconnects for Advanced Technology Nodes
- - C. Penny
  - K. Motoyama
  - et al.
- 2025
- IITC 2025
Impact of process chambers exhaust on wafer defectivity in wet clean tools
- - Kedari Matam
  - B. Peethala
  - et al.
- 2020
- ASMC 2020