In situ Fourier transform infrared spectroscopy and stochastic modeling of surface chemistry of amorphous silicon growth
- U. Wetterauer
- J. Knobloch
- et al.
- 1998
- Journal of Applied Physics
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.