Conductive polyaniline: Applications in x-ray mask making
- M.S. Lawliss
- J.M. Rocque
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
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4 results for D.M. Puisto
Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes
- D.L. Laird
- R. Engelstad
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Image placement errors in x-ray masks induced by changes in resist stress during electron-beam writing
- R.E. Acosta
- Denise Puisto
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
High-accuracy defect-free X-Ray mask technology
- Steven C. Nash
- Thomas B. Faure
- et al.
- 1994
- Japanese Journal of Applied Physics