Dissolution kinetics and PAG interaction of phenolic resins in chemically amplified resists
- Hiroshi Ito
- Debra-Fenzel Alexander
- et al.
- 1997
- J. Photopolym. Sci. Tech.
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.