Low energy electron beam top surface image processing using chemically amplified AXT resist
- C.S. Whelan
- D.M. Tanenbaum
- et al.
- 1997
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
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High resolution electron beam lithography using ZEP-520 and KRS resists at low voltage
- D.M. Tanenbaum
- C.W. Lo
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures