Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes
- D.L. Laird
- R. Engelstad
- et al.
- 1996
- Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.