Design, preparation, characterization, and lithographic imaging of high performance chemically amplified deep UV resist
- Hiroshi Ito
- G. Breyta
- et al.
- 1997
- ACS Spring 1997
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Lithographic feasibility of escap beyond quarter micron
- Hiroshi Ito
- Greg Breyta
- et al.
- 1996
- J. Photopolym. Sci. Tech.
A new positive DUV photoresist optimized for 0.25 μm isolated lines
- T. Lindsay
- G.G. Barclay
- et al.
- 1997
- Microelectronic Engineering