Publications

3 results for Timothy R. Farrell

Selection of attenuated phase shift mask compatible contact hole resists for KrF optical lithography
- - Zhijian G. Lu
  - Yuping Cui
  - et al.
- 1999
- SPIE Advances in Resist Technology and Processing 1999
Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- - R. Ferguson
  - Christopher P. Ausschnitt
  - et al.
- 1994
- VLSI Technology 1994
The application of deep UV phase shifted-single layer halftone reticles to 256 mbit dynamic random access memory cell patterns
- - Kohji Hashimoto
  - Donald J. Samuels
  - et al.
- 1994
- Japanese Journal of Applied Physics