Optimization of resolution-enhanced photolithography for a 256Mb DRAM cell
- R. Ferguson
- Christopher P. Ausschnitt
- et al.
- 1994
- VLSI Technology 1994
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7 results for Ronald M. Martino
A comprehensive evaluation of major phase shift mask technologies for isolated gate sinictuies in logic designs
- Lars W. Liebmann
- Thomas H. Newman
- et al.
- 1994
- Microlithography 1994
Impact of attenuated mask topography on lithographic performance
- Richard A. Ferguson
- William J. Adair
- et al.
- 1994
- Microlithography 1994
Application of the Aerial Image Measurement System (AIMSTM) to the Analysis of Binary Mask Imaging and Resolution Enhancement Techniques
- R. Martino
- R. Ferguson
- et al.
- 1994
- Microlithography 1994
Quantitative stepper metrology using the focus monitor test mask
- T.A. Brunner
- A.L. Martin
- et al.
- 1994
- Microlithography 1994
Negative tone aqueous developable resist for photon electron and X-ray lithography
- Willard Conley
- Wayne Moreau
- et al.
- 1990
- Microlithography 1990
The application of deep UV phase shifted-single layer halftone reticles to 256 mbit dynamic random access memory cell patterns
- Kohji Hashimoto
- Donald J. Samuels
- et al.
- 1994
- Japanese Journal of Applied Physics