Positive bilayer resists for 248- and 193-nm lithography
- Ratnam Sooriyakumaran
- Gregory M. Wallraff
- et al.
- 1998
- Microlithography 1998
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48 results for Qinghuang Lin
Etch selectivity of 4SiMA: Hydroxystyrene based copolymers. silicon chemistry for bilayer resist systems
- G.M. Wallraff
- Carl E. Larson
- et al.
- 1998
- J. Photopolym. Sci. Tech.
Roadmap on biological pathways for electronic nanofabrication and materials
- Mark Bathe
- Linda A. Chrisey
- et al.
- 2019
- Nano Futures
Scalable Nanostructured Carbon Electrode Arrays for Enhanced Dopamine Detection
- Silvia Demuru
- Luca Nela
- et al.
- 2018
- ACS Sensors
Effects of cesium ion implantation on the mechanical and electrical properties of porous SiCOH low- k dielectrics
- Weiyi Li
- Dongfei Pei
- et al.
- 2017
- JVSTA
Effects of cesium ion-implantation on mechanical and electrical properties of organosilicate low-k films
- Weiyi Li
- Dongfei Pei
- et al.
- 2016
- Applied Physics Letters
Probing the molecular structures of plasma-damaged and surface-repaired low-k dielectrics
- Xiaoxian Zhang
- John N. Myers
- et al.
- 2015
- Physical Chemistry Chemical Physics
Nondestructive in situ characterization of molecular structures at the surface and buried interface of silicon-supported low-k dielectric films
- John N. Myers
- Xiaoxian Zhang
- et al.
- 2015
- Journal of Physical Chemistry B
In situ observation of water behavior at the surface and buried interface of a low-K dielectric film
- Xiaoxian Zhang
- John N. Myers
- et al.
- 2014
- ACS AMI
Measurement of bandgap energies in low-k organosilicates
- M.T. Nichols
- Weiyi Li
- et al.
- 2014
- Journal of Applied Physics