Application of blends and side chain Si-O copolymers as high etch resistant sub 100 nm E-beam resists
- Wu-Song Huang
- Ranee Kwong
- et al.
- 2002
- Proceedings of SPIE-The International Society for Optical Engineering
Publications
This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.
Date
Featured collections
Popular topics
48 results for Qinghuang Lin
Characterization of thin and ultrathin polymer and resist films
- Dario L. Goldfarb
- Qinhuang Lin
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Line edge roughness in positive-tone chemically amplified resists: Effect of additives and processing conditions
- Qinghuang Lin
- Dario L. Goldfarb
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Feature-shape and line-edge roughness measurement of deep sub-micron lithographic structures using small-angle neutron scattering
- Eric K. Lin
- Wen-li Wu
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
When is bilayer thin-film imaging suitable: Comparison with single layer resists
- Scott Halle
- Alan Thomas
- et al.
- 2001
- Proceedings of SPIE - The International Society for Optical Engineering
Small angle neutron scattering measurements of nanoscale lithographic features
- Wen-Li Wu
- Eric K. Lin
- et al.
- 2000
- Journal of Applied Physics
Transfer etching of bilayer resists in oxygen-based plasmas
- A. Mahorowala
- K. Babich
- et al.
- 2000
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Diffusion and distribution of photoacid generators in thin polymer films
- Qinghuang Lin
- Marie Angelopoulos
- et al.
- 2000
- Materials Research Society Symposium - Proceedings