Publications

This is our catalog of publications authored by IBM researchers, in collaboration with the global research community. It’s an ever-growing body of work that shows why IBM is one of the most important contributors to modern computing.

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199 results for Rajiv V. Joshi

Surface reactions in the chemical vapor deposition of tungsten using WF₆ and SiH₄ on Al, PtSi, and TiN
- - Ming L. Yu
  - Kie Y. Ahn
  - et al.
- 1990
- Journal of Applied Physics
Mechanisms controlling temperature dependent mechanical and electrical behavior of SiH₄ reduced chemically vapor deposited W
- - R.V. Joshi
  - V. Prasad
  - et al.
- 1990
- Journal of Applied Physics
Surface chemistry of the WF₆-based chemical vapor deposition of tungsten
- - M.L. Yu
  - K.Y. Ahn
  - et al.
- 1990
- IBM J. Res. Dev
Novel self-aligned W/TiN/TiSi₂ contact structure for very shallow junctions and interconnections
- - R.V. Joshi
  - D. Moy
  - et al.
- 1989
- Applied Physics Letters
Comparison of the diffusion barrier properties of tungsten films prepared by hydrogen and silicon reduction of tungsten hexafluoride
- - O. Thomas
  - A. Charai
  - et al.
- 1989
- Thin Solid Films
Ion-implantation-induced fluorine agglomeration in tungsten disilicide prepared by low-pressure chemical vapour deposition
- - C.Sture Petersson
  - Harry J. Whitlow
  - et al.
- 1989
- Nuclear Inst. and Methods in Physics Research, B
Effect of excess silicon on behavior of LPCVD WSi_x films on silicon
- - R.V. Joshi
  - Young H. Kim
  - et al.
- 1988
- Thin Solid Films
Properties of selective low pressure chemically vapor deposited tungsten films produced by hydrogen reduction in a cold wall system
- - R.V. Joshi
  - D.A. Smith
  - et al.
- 1988
- Thin Solid Films
Stacking faults in WSi₂: Resistivity effects
- - F.M. d'Heurle
  - F.K. LeGoues
  - et al.
- 1986
- Applied Physics Letters