Patterning method impact on sub-36nm pitch interconnect variability
- N.V. Licausi
- James C.-H. Chen
- et al.
- 2018
- SPIE Advanced Lithography 2018
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An evaluation of Fuchs-Sondheimer and Mayadas-Shatzkes models below 14nm node wide lines
- R. S. Smith
- E. T. Ryan
- et al.
- 2019
- AIP Advances