Future of plasma etching for microelectronics: Challenges and opportunities
- Gottlieb S. Oehrlein
- Stephan M. Brandstadter
- et al.
- 2024
- Journal of Vacuum Science and Technology B
Publications
5 results for Richard A. Gottscho
Rethinking surface reactions in nanoscale dry processes toward atomic precision and beyond: A physics and chemistry perspective
- Kenji Ishikawa
- Tatsuo Ishijima
- et al.
- 2019
- Japanese Journal of Applied Physics
The cao d, d 1, 3δ-a3π system: Sub-doppler spectrum, rotational analysis, and deperturbation
- Ronald F. Marks
- Richard A. Gottscho
- et al.
- 2006
- Physica Scripta
The Gaseous Electronics Conference radio-frequency reference cell: A defined parallel-plate radio-frequency system for experimental and theoretical studies of plasma-processing discharges
- P.J. Hargis Jr.
- K.E. Greenberg
- et al.
- 1994
- Review of Scientific Instruments
The orange arc bands of CaO. Analysis of a D,d 1,3Δ-a 3Π system
- Ronald F. Marks
- Hartmut S. Schweda
- et al.
- 1981
- The Journal of Chemical Physics