Improved reflectivity control of APEX-E positive tone deep-UV photoresist
- Willard Conley
- Ravindra Akkapeddi
- et al.
- 1994
- Microlithography 1994
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3 results for Gary Spinillo
TAR processing for CD control in I-line and 248 nm lithography
- Christopher Lyons
- Nicholas Eib
- et al.
- 1993
- Microlithography 1993
Negative tone aqueous developable resist for photon electron and X-ray lithography
- Willard Conley
- Wayne Moreau
- et al.
- 1990
- Microlithography 1990