Publications

2 results for Y.D. Park

Effect of inert gas additive on Cl₂-based inductively coupled plasma etching of NiFe and NiFeCo
- - K.B. Jung
  - H. Cho
  - et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Relative merits of [formula omitted] and [formula omitted] plasma chemistries for dry etching of magnetic random access memory device elements
- - K.B. Jung
  - H. Cho
  - et al.
- 1999
- Journal of Applied Physics