Effect of inert gas additive on Cl2-based inductively coupled plasma etching of NiFe and NiFeCo
- K.B. Jung
- H. Cho
- et al.
- 1999
- Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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Relative merits of [formula omitted] and [formula omitted] plasma chemistries for dry etching of magnetic random access memory device elements
- K.B. Jung
- H. Cho
- et al.
- 1999
- Journal of Applied Physics