Publications

3 results for Colleen Meagher

Novel Advanced Low-k Dielectric for 2 nm and Beyond Cu and Post Cu Dual Damascene BEOL Interconnect Technologies
- - Son Nguyen
  - Huai Huang
  - et al.
- 2025
- VLSI Technology and Circuits 2025
Wet clean oxidation for optimal line width and LER
- - Steven McDermott
  - Keith Donegan
  - et al.
- 2025
- SPIE Advanced Lithography + Patterning 2025
The Extreme Extendibility of Cu and Post-Cu Dual Damascene BEOL Interconnect Technology
- - Daniel Edelstein
  - Son Nguyen
  - et al.
- 2024
- IEDM 2024