Publications

2 results for Xiaoli He

Compressive Diffusion Break Stressor for Gate-All-Around Nanosheet pFET Transistor Performance Improvement
- - Steven Hung
  - Shogo Mochizuki
  - et al.
- 2025
- VLSI Technology and Circuits 2025
Advanced Multi-Vt Enabled by Selective Layer Reductions for 2nm Nanosheet Technology and Beyond
- - Ruqiang Bao
  - Yusuke Oniki
  - et al.
- 2024
- IEDM 2024