Publications

2 results for Sriharsha Sudhindra

Dose reduction strategies for low-n PSM absorber using pupil and mask bias optimization at 0.33NA EUV lithography
- - Rajiv Sejpal
  - Gopal Kenath
  - et al.
- 2025
- Photomask Japan 2025
Advanced Multi-Vt Enabled by Selective Layer Reductions for 2nm Nanosheet Technology and Beyond
- - Ruqiang Bao
  - Yusuke Oniki
  - et al.
- 2024
- IEDM 2024