Novel Advanced Low-k Dielectric for 2 nm and Beyond Cu and Post Cu Dual Damascene BEOL Interconnect TechnologiesS. NguyenH. Huanget al.2025VLSI Technology and Circuits 2025
Innovations Enabling the Continued Extendibility of Cu and Post-Cu Damascene BEOL TechnologiesD. EdelsteinA. Joget al.2025IITC 2025
Evaluation of Cu surface diffusion on different metal liner materials for Cu reflow applicationsO. van der StratenL.W. Wangoh2024Journal of Materials Research