Reactive Vapor-Phase Inhibitors for Area-Selective Depositions at Tunable Critical Dimensions
- Lawal Adewale Ogunfowora
- Ishwar Singh
- et al.
- 2024
- JACS
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Simultaneous Co-localized TiO2 Etching and W Atomic Layer Deposition Using WF6 as a Dual-Functional Reactant
- Hannah R. M. Margavio
- Noel Arellano
- et al.
- 2024
- Chemistry of Materials