Publications

8 results for Yinjie Cen

Commercialization of Non-PFAS KrF and Development of Non-PFAS EUV Photoresists
- - Cong Liu
  - Joseph Lachowski
  - et al.
- 2025
- SPIE Advanced Lithography 2025
The Impact of Polymer Compositional Homogeneity on Lithography and Defects
- - Benjamin D. Rafael-Naab
  - Jong Keun Park
  - et al.
- 2025
- SPIE Advanced Lithography 2025
New Photoacid Generators Designed for Advanced EUV Patterning
- - Kamal P. Pandey
  - Emad Aqad
  - et al.
- 2025
- SPIE Advanced Lithography 2025
Consideration on segregation behavior of the surface localization material and the pattern roughness degradation in EUV lithography
- - KwangMo Choi
  - YunJi Kim
  - et al.
- 2025
- SPIE Advanced Lithography 2025
Impact of increasing EUV absorption of CAR polymers on lithographic performance
- - Yinjie Cen
  - Emad Aqad
  - et al.
- 2024
- SPIE Advanced Lithography 2024
Identifying trends in photoresist polymer properties to improve line and space defects Considerations to Improve Microbridge Defectivity in EUV Chemically Amplified Photoresists
- - Benjamin D. Rafael-Naab
  - Jong Keun Park
  - et al.
- 2024
- SPIE Advanced Lithography 2024
Novel spin-on overcoat materials for EUV photoresist enhancement
- - Xisen Hou
  - Yinjie Cen
  - et al.
- 2024
- SPIE Advanced Lithography 2024
Advanced EUV CAR small molecule compounds design and its impact to etch performance
- - Yinjie Cen
  - Jong Keun Park
  - et al.
- 2024
- SPIE Advanced Lithography 2024