The Impact of Polymer Compositional Homogeneity on Lithography and Defects
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2025
- SPIE Advanced Lithography 2025
Publications
8 results for Jong Keun Park
New Molecular Resist Design for Advanced Patterning
- Vageesha Liyana Gunawardana
- Emad Aqad
- et al.
- 2025
- SPIE Advanced Lithography 2025
Consideration on segregation behavior of the surface localization material and the pattern roughness degradation in EUV lithography
- KwangMo Choi
- YunJi Kim
- et al.
- 2025
- SPIE Advanced Lithography 2025
Disruptive non-fluorinated photoacid generators using computational chemistry and library design
- P. Labeaume
- K. Hernandez
- et al.
- 2024
- SPIE Advanced Lithography 2024
Advanced EUV CAR small molecule compounds design and its impact to etch performance
- Yinjie Cen
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Impact of increasing EUV absorption of CAR polymers on lithographic performance
- Yinjie Cen
- Emad Aqad
- et al.
- 2024
- SPIE Advanced Lithography 2024
Identifying trends in photoresist polymer properties to improve line and space defects Considerations to Improve Microbridge Defectivity in EUV Chemically Amplified Photoresists
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Acid generation efficiency prediction by bond cleavage calculation of EUV photoacid generators
- Jayoung Koo
- YunJi Kim
- et al.
- 2024
- SPIE Advanced Lithography 2024