New Photoacid Generators Designed for Advanced EUV Patterning
- Kamal P. Pandey
- Emad Aqad
- et al.
- 2025
- SPIE Advanced Lithography 2025
Publications
6 results for Rochelle Rena
New Molecular Resist Design for Advanced Patterning
- Vageesha Liyana Gunawardana
- Emad Aqad
- et al.
- 2025
- SPIE Advanced Lithography 2025
The Impact of Polymer Compositional Homogeneity on Lithography and Defects
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2025
- SPIE Advanced Lithography 2025
Identifying trends in photoresist polymer properties to improve line and space defects Considerations to Improve Microbridge Defectivity in EUV Chemically Amplified Photoresists
- Benjamin D. Rafael-Naab
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Advanced EUV CAR small molecule compounds design and its impact to etch performance
- Yinjie Cen
- Jong Keun Park
- et al.
- 2024
- SPIE Advanced Lithography 2024
Impact of increasing EUV absorption of CAR polymers on lithographic performance
- Yinjie Cen
- Emad Aqad
- et al.
- 2024
- SPIE Advanced Lithography 2024